Investigation of Metal Membranes using High-Resolution Synchrotron CT and Synchrotron Diffraction

VAT is a global leader in the development of high vacuum solutions that are essential for the production of semiconductors, displays, and digital technologies. 

In its continuous efforts to optimize product performance and manufacturing quality, VAT sought to gain a deeper understanding of the geometric deviations and residual stresses generated during the stamping of metal membranes. A detailed characterization of these features was required to support process optimization and ensure the long-term reliability of the components.

ANAXAM’s applied materials analytics using high-resolution Synchrotron CT and Synchrotron Diffraction was applied to investigate stamped membranes. Synchrotron CT enabled the precise measurement and analysis of geometric deviations, providing detailed insight into the membrane shape after forming. Complementary synchrotron diffraction measurements were used to quantify residual stresses induced during the stamping process. 

Together, these advanced characterization techniques provided valuable insights into the structural and stress-related properties of the membranes, offering a useful basis for further investigations into manufacturing processes and component reliability.